Description

Ratio Controller is used for proportioning foam concentrate into the water supply with a wide range of flow and pressure. The Ratio Controller is also used with Bladder Tank Proportioning System, Inline Balance Proportioning System and Skid Mounted Pump Balance Proportioning System.
SPECIFICATION
The Ratio Controller works on venturi principle. As the water flow passes through nozzle at the inlet of ratio controller, a low-pressure area is created between inlet nozzle and the down stream section called diffuser. This low-pressure area causes the foam concentrate to flow through a metering orifice at the concentrate inlet and into the low-pressure area. As the system demand varies, the water jet through
Ratio Controller increases or decreases, which in turn varies the pressure at the low-pressure area of the Ratio Controller. This affects the corresponding pressure across the foam concentrate-metering orifice. The system requires same pressure of water and concentrate in order to balance the proportioning system.
INSTALLATION
Ratio Controller Model RCW is wafer style to be mounted in SCH40 pipe between two flanges while Model RCF has flanged end connection. Flow direction arrow is marked on the Ratio Controller.
NOTE
1) A minimum of five pipe diameter of straight unobstructed pipe is required at upstream and downstream of each ratio controller.
2) Ratio Controller shall be installed between two ANSI 150# flanges with raised face or flat face. Gaskets, studs & flanges shall beĀ rovided
by the installer.
3) Provision shall be made in piping for removal of Ratio Controller.
4) The pipes on upstream & downstream side of the Ratio Controller must be adequately supported and no strain shall be imposed on Ratio Controller.
5) Ratio Controller is UL Listed/ FM Approved with HD Bladder Tank, Refer to specific UL Listing / FM Approval data for more information.
6) Ratio Controller is UL Listed for 2.1 to 12 bar pressure.
7) For Flow data, when used with Inline Balance pressure proportioner, contact HD Fire Sales.